International Journal For Multidisciplinary Research
E-ISSN: 2582-2160
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Volume 8 Issue 2
March-April 2026
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SETU: A Fairness-Aware AI Framework for Optimizing Student-Internship Matching in Large-Scale National Schemes
| Author(s) | Meet Bhuva, Aditya Kumar Gautam, Dharambir Singh Sidhu, Dr. NB Prakash, Kumar Tanmay |
|---|---|
| Country | India |
| Abstract | Internship programs are pivotal for bridging the gap between academic knowledge and industry demands. In India, the Prime Minister Internship Scheme (PMIS) aims to provide one crore internships over five years, yet it faces significant challenges, including a mere 5% conversion rate from application to participation, skill-opportunity mismatches, and systemic biases. This paper introduces SETU (Smart Employment and Training Unification), a novel AI-driven framework designed to overhaul the PMIS matching process. SETU leverages a multi-faceted approach, integrating Natural Language Processing (NLP) for deep resume and job description analysis, advanced embedding models for semantic skill matching, and a predictive analytics module to estimate a candidate’s likelihood of joining. A core contribution of our work is the integration of a fairness-aware optimization layer, specifically designed to mitigate geographic and demographic biases, ensuring equitable access for students from underrepresented backgrounds. We propose a scalable, cloud-based architecture that can handle millions of users while providing personalized, fair, and efficient internship recommendations. This system aims to significantly increase the conversion rate, enhance the overall impact of the PMIS, and ensure that the right student is matched with the right opportunity on a national scale. |
| Keywords | Recommender Systems, Natural Language Pro- cessing, Fairness-Aware Machine Learning, Internship Matching, Predictive Analytics, Skill Extraction, PMIS. |
| Field | Computer > Data / Information |
| Published In | Volume 8, Issue 2, March-April 2026 |
| Published On | 2026-04-03 |
| DOI | https://doi.org/10.36948/ijfmr.2026.v08i02.72470 |
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E-ISSN 2582-2160
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